发明名称 Inductively coupled plasma source using induced eddy currents
摘要 Methods and apparatus are provided for generating an inductively coupled plasma using induced eddy currents. An inductively coupled plasma source of the invention generally comprises a body constructed substantially of a conductive material interrupted by at least one dielectric gap. Radio frequency power is coupled from a current carrier into the conductive body. The one or more dielectric interruptions in the conductive body are disposed so as to cause eddy currents to circulate about portions of the body and thereby couple RF power into a plasma in proximity to the conductive body. By utilizing induced eddy currents to couple power into a plasma, the invention allows for substantial bodies of conductive materials, such as structural metals, to be interposed between the induction coils that receive power from a power generator and the plasma.
申请公布号 US2005194099(A1) 申请公布日期 2005.09.08
申请号 US20040792462 申请日期 2004.03.03
申请人 JEWETT RUSSELL F.JR.;SCHOLL RICHARD A. 发明人 JEWETT RUSSELL F.JR.;SCHOLL RICHARD A.
分类号 B31B1/60;C23F1/00;(IPC1-7):C23F1/00 主分类号 B31B1/60
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