发明名称 Pattern system generation apparatus and pattern application apparatus
摘要 A pattern system generation apparatus of the present invention includes a pattern information storage unit for storing plural patterns usable for object-oriented software development, a pattern system definition unit capable of defining an order relation between two of the plural patterns, an inter-pattern association information storage unit for storing the order relation define for two of the plural patterns, and an inter-pattern conflict detection unit for detecting conflicting elements in the defined order relation; and a pattern application apparatus of the present invention includes the pattern information storage unit, the inter-pattern association information storage unit, a pattern application unit for detailing a model to be developed by applying a pattern stored in the pattern information storage unit to the model, and a pattern system navigation unit capable of activating the pattern application unit by specifying the model to be developed and a pattern.
申请公布号 US2005198616(A1) 申请公布日期 2005.09.08
申请号 US20040016756 申请日期 2004.12.21
申请人 FUJITSU LIMITED 发明人 UEHARA TADAHIRO;MATSUDA TOMOTAKA;INOMATA JUNJI
分类号 G06F9/44;(IPC1-7):G06F9/44 主分类号 G06F9/44
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