Lithographic apparatus, method of substrate identification, device manufacturing method, substrate, and computer program

摘要

In a method according to an embodiment of the invention, substrate identification is performed by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance.