发明名称 ELECTROSTATIC CHUCK
摘要 PROBLEM TO BE SOLVED: To overcome the problem that it is difficult to obtain gradient force as large suction force even if a high voltage is applied, and sufficient suction force can not be obtained even if an insulative substrate is sucked since the insulative substrate such as a liquid crystal substrate is not electrically conductive like a conductor or a semiconductor such as a silicon wafer used for a semiconductor substrate. SOLUTION: In an electrostatic chuck formed with an insulative layer for covering an upper face of an adsorptive electrode, the suction electrode comprises a plurality of suction electrodes, a density of intermediate lines at an equal distance from the adsorptive electrodes is 100-5,000/m in a region in which independent adsorptive electrodes face each other, and a withstand voltage between the adsorptive electrodes is≥2 kV. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005245106(A) 申请公布日期 2005.09.08
申请号 JP20040050330 申请日期 2004.02.25
申请人 KYOCERA CORP 发明人 NAKAMURA TSUNEHIKO
分类号 B23Q3/15;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H02N13/00 主分类号 B23Q3/15
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