| 摘要 |
Disclosed is a plasma processing apparatus having a plasma producing portion and a porous plate provided between the plasma producing portion and an object to be processed, wherein the porous plate has a plurality of holes which are made non-uniform with respect to at least one of shape, size and disposition. Specifically, the shape, the size or the disposition of the holes is determined on the basis of an active species distribution at the plasma producing portion and of diffusion calculation, so that plasma active species adjacent the object to be processed has desired concentration and distribution. This assures uniform plasma distribution adjacent the object while a decrease of plasma density can be well suppressed.
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