Method of forming a thin film using a plasma enhanced cyclic deposition technique,申请号KR20030029516-传众专利搜索

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发明名称	Method of forming a thin film using a plasma enhanced cyclic deposition technique
摘要
申请公布号	KR100512938(B1)	申请公布日期	2005.09.07
申请号	KR20030029516	申请日期	2003.05.09
申请人		发明人
分类号	H01L21/205;(IPC1-7):H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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