METHOD FOR FORMING ISOLATION LAYER IN SEMICONDUCTOR DEVICE,申请号KR20030091423-传众专利搜索

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发明名称	METHOD FOR FORMING ISOLATION LAYER IN SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100511923(B1)	申请公布日期	2005.09.05
申请号	KR20030091423	申请日期	2003.12.15
申请人		发明人
分类号	H01L21/76;(IPC1-7):H01L21/76	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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