| 发明名称 |
Ultra high transmission phase shift mask blanks |
| 摘要 |
The present invention relates to phase shift mask blanks for exposure wavelength of less than 300 nm, a process for their preparation, to phase shift masks manufactured by such phase shift mask blanks and a process for the preparation of said phase shift masks.
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| 申请公布号 |
US2005190450(A1) |
申请公布日期 |
2005.09.01 |
| 申请号 |
US20050040115 |
申请日期 |
2005.01.24 |
| 申请人 |
BECKER HANS;SCHMIDT FRANK;GOETZBERGER OLIVER;HESS GUENTER;BUTTGEREIT UTE;SOBEL FRANK;RENNO MARKUS |
发明人 |
BECKER HANS;SCHMIDT FRANK;GOETZBERGER OLIVER;HESS GUENTER;BUTTGEREIT UTE;SOBEL FRANK;RENNO MARKUS |
| 分类号 |
H01L21/027;C03C17/34;C23C16/455;G03F1/00;G03F1/08;(IPC1-7):G02B27/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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