发明名称 |
Method and apparatus for producing phase shifter masks |
摘要 |
The invention relates to a method and an apparatus for producing phase shifter masks for 157 nm lithography. A coating has an organic material and is at least partially configured on the phase shifter mask. This coating is processed with an electron beam. This allows efficient production of very small structures, even for 157 nm lithography.
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申请公布号 |
US2005191561(A1) |
申请公布日期 |
2005.09.01 |
申请号 |
US20030614429 |
申请日期 |
2003.07.07 |
申请人 |
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发明人 |
SCHILZ CHRISTOF M.;EISNER KLAUS |
分类号 |
G03F1/00;(IPC1-7):G03F9/00;A61N5/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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