发明名称 METHOD FOR FORMING PLATING FILM, ELECTROMAGNETIC SHIELDING MATERIAL AND CASING
摘要 <p>A method for forming a plating film is characterized in that a plating film is formed on the surface of a member composed of a synthetic resin material by sequentially performing a step for degreasing/cleaning the surface, a step for applying a primer coating material containing a catalyst to the surface, a step for forming a copper plating film thereon by nonelectrolytic plating, and a step for forming an antirust film thereon by a benzotriazole treatment. A plating process can be simplified by this method for forming a plating film. Also disclosed are an electromagnetic shielding material and a casing.</p>
申请公布号 WO2005080634(A1) 申请公布日期 2005.09.01
申请号 WO2005JP03227 申请日期 2005.02.21
申请人 KABUSHIKI KAISHA TOSHIBA;CHUO KASEIHIN CO., INC.;ABE, TADATO;TSUKADA, NORIKAZU 发明人 ABE, TADATO;TSUKADA, NORIKAZU
分类号 C23C18/38;C23C18/16;C23C18/28;C23C18/30;C23C18/31;(IPC1-7):C23C18/38 主分类号 C23C18/38
代理机构 代理人
主权项
地址