发明名称 |
METHOD FOR FORMING PLATING FILM, ELECTROMAGNETIC SHIELDING MATERIAL AND CASING |
摘要 |
<p>A method for forming a plating film is characterized in that a plating film is formed on the surface of a member composed of a synthetic resin material by sequentially performing a step for degreasing/cleaning the surface, a step for applying a primer coating material containing a catalyst to the surface, a step for forming a copper plating film thereon by nonelectrolytic plating, and a step for forming an antirust film thereon by a benzotriazole treatment. A plating process can be simplified by this method for forming a plating film. Also disclosed are an electromagnetic shielding material and a casing.</p> |
申请公布号 |
WO2005080634(A1) |
申请公布日期 |
2005.09.01 |
申请号 |
WO2005JP03227 |
申请日期 |
2005.02.21 |
申请人 |
KABUSHIKI KAISHA TOSHIBA;CHUO KASEIHIN CO., INC.;ABE, TADATO;TSUKADA, NORIKAZU |
发明人 |
ABE, TADATO;TSUKADA, NORIKAZU |
分类号 |
C23C18/38;C23C18/16;C23C18/28;C23C18/30;C23C18/31;(IPC1-7):C23C18/38 |
主分类号 |
C23C18/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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