发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 There is provided a semiconductor device including a semiconductor substrate and a conductive layer above the semiconductor substrate, wherein the conductive layer contains copper, a surface region of the conductive layer contains at least one of C-H bonds and C-C bonds, and a total amount of C atoms forming the C-H bonds and C atoms forming the C-C bonds in the surface region is 30 atomic % or more of a whole amount of elements in the surface region.
申请公布号 KR100511039(B1) 申请公布日期 2005.08.30
申请号 KR20040035218 申请日期 2004.05.18
申请人 发明人
分类号 H01L21/28;H01L21/312;H01L21/60;H01L21/768;H01L23/532 主分类号 H01L21/28
代理机构 代理人
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