| 摘要 |
The invention relates to a method for treating an implant surface intended for implantation into bone tissue wherein a microroughness comprising pores and peaks having a pore diameter of <=1 mum, a pore depth of <=500 nm, and a peak width, at half the pore depth, of from 15 to 150% of the pore diameter is provided. The invention also relates to an implant comprising a surface having the above characteristics. |
