发明名称 TRANSFER TYPE SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent uneven processings when the surface of a substrate is processed with shower, while making the substrate move along the direction of the transfer of the same. SOLUTION: A shower unit 30 comprises a plurality of shower pipes 31 arranged perpendicularly in the substrate conveying direction, a plurality of shower nozzles 33 each being mounted at a predetermined interval on each shower pipe 31, and a manifold 32 intersecting each shower pipe 31 to supply a processing solution to the plurality of the shower pipes 31. The plurality of the shower pipes 31 rock the many shower nozzles 33 to both sides, by rotating them in a reciprocating manner in synchronism with a predetermined angle in the peripheral direction. Each shower pipe 31 penetrates the manifold 32 and protrudes at its one end, and includes the shower nozzles 33 at its protruding end. Since interferences due to the manifold 32 are eliminated, the processing solution can be showered without dead angle. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005228958(A) 申请公布日期 2005.08.25
申请号 JP20040036892 申请日期 2004.02.13
申请人 SUMITOMO PRECISION PROD CO LTD 发明人 AKASAKA TAKESHI
分类号 G02F1/13;B05B1/18;B05C5/00;G02F1/1333;H01L21/304;H01L21/306;(IPC1-7):H01L21/304;G02F1/133 主分类号 G02F1/13
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