| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exposure method and an exposure device of a photomask for carrying out pattern drawing in a work chamber while resist applied blanks are subjected to soaking in advance for a fixed time in a sub-chamber in pattern drawing in the resist applied blanks. <P>SOLUTION: In the exposure method of the photomask, while the resist applied blanks are subjected to soaking in advance for a fixed time in a sub-chamber in its vacuum state, the resist applied blanks which finished soaking are subjected to pattern drawing in the drawing device of the work chamber. The photomask exposure device is constituted of the work chamber 10 wherein the drawing device is installed, two sub-chambers 20 for loading and unloading the resist applied blanks, and the sub-chamber 30. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
