发明名称 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
摘要 The present invention controls a temperature of a processing liquid to be in within an allowable processing temperature range, whereby the processing efficiency and throughputs can be improved, deterioration of the processing liquid is prevented, and the life of the processing liquid can be extended. In the liquid processing method, a chemical liquid L stored in a tank 10 can have temperatures controlled by heating and cooling by a heater 1 and cooling means 2 and is circulated for stand-by. the chemical liquid L in the stand-by circulation is supplied to wafers loaded in a processing chamber 6 to process the wafers, a cooling medium of the cooling means 2 is heat-exchanged with the chemical liquid L in the tank 10 to be ready for the next stand-by circulation.
申请公布号 US2005183755(A1) 申请公布日期 2005.08.25
申请号 US20050071124 申请日期 2005.03.02
申请人 TOKYO ELECTRON LIMITED 发明人 FUJISHIMA SADAYUKI
分类号 H01L21/304;H01L21/00;(IPC1-7):B08B3/00 主分类号 H01L21/304
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