发明名称 Patterning substrate and cell culture substrate
摘要 The present invention intends primarily to provide such as a cell culture patterning substrate that is used to adhere a cell in a highly precise pattern on a base material to culture and a cell culture substrate on which a cell is adhered in a high precision pattern. In order to achieve the above-mentioned object, the present invention provides a patterning substrate having a base material and a cell culture patterning layer that is formed on the base material and has at least a photocatalyst and a cell adhesive material that has the adhesiveness with the cell and is decomposed or modified owing to an action of the photocatalyst in combination with energy irradiation.
申请公布号 US2005186674(A1) 申请公布日期 2005.08.25
申请号 US20040986641 申请日期 2004.11.12
申请人 MIYAKE HIDEYUKI;HATTORI HIDESHI;KOBAYASHI HIRONORI 发明人 MIYAKE HIDEYUKI;HATTORI HIDESHI;KOBAYASHI HIRONORI
分类号 C12M3/00;C12N5/00;C12N5/02;C12N11/00;H01L21/00;(IPC1-7):C12N5/02 主分类号 C12M3/00
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