| 摘要 |
PROBLEM TO BE SOLVED: To provide a porous silica film having uniform pores, excellent surface smoothness and suitably used for an optical functional material, electronic functional material, a semiconductor material or the like. SOLUTION: The porous silica film free from radial streak, striped pattern or the like and having excellent surface smoothness is obtained by using a coating liquid for forming the porous silica film which contains a silane compound (A) containing alkoxy silane having at least Si-O-Si bond, a surfactant (B), an organic compound (C) having 150-300°C boiling point, dielectric constant of≥25 and 2.0-1,000 cP viscosity at 20°C and a solvent (D), applying the coating liquid on a base material, evaporating the solvent (D) and removing the surfactant. COPYRIGHT: (C)2005,JPO&NCIPI
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