发明名称 METHOD OF CRYSTALLIZING SILICON
摘要 A light having a pulse frequency higher than about 300Hz is generated. The light is irradiated on an amorphous silicon thin film for a predetermined time period to form an initial polysilicon crystal. The light is transported in a predetermined direction to grow the initial polysilicon crystal. A laser beam having a decreased output energy is irradiated on the amorphous silicon thin film to crystallize the amorphous silicon thin film to a polysilicon thin film so that the load of an apparatus for generating the laser beam is decreased, and the lifetime of the apparatus for generating the laser beam increases.
申请公布号 WO2005078168(A2) 申请公布日期 2005.08.25
申请号 WO2004KR01104 申请日期 2004.05.13
申请人 SAMSUNG ELECTRONICS CO., LTD.;KIM, DONG-BYUM;CHUNG, SE-JIN;CHUNG, UI-JIN 发明人 KIM, DONG-BYUM;CHUNG, SE-JIN;CHUNG, UI-JIN
分类号 H01L21/324;B23K26/06;B23K26/067;B23K26/073;C30B29/06;C30B30/00;C30B35/00;H01L21/20;H01L21/336;H01L29/04;H01L29/786 主分类号 H01L21/324
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