| 摘要 |
Provided is a mask data processor capable of expanding a design data throughout the entire area of a mask. A storage device (MR) inputs a design data of sub-chips (D 1 ) and mask data creation specification data (D 2 ) to a pattern-density data generation device ( 10 ). Then, a data execution part ( 11 ) performs an arithmetic execution to the design data of sub-chips (D 1 ) based on the mask data creation specification data (D 2 ), followed by automatic mask data generation processing, layer arithmetic execution processing, and dummy pattern generation processing. When calculating a pattern graphic area, a graphic area calculation part ( 12 ) eliminates any overlap between graphics in order to avoid duplicate calculation. Based on the pattern graphic area, a pattern-density data calculation part ( 13 ) calculates the area ratios of graphic elements, i.e., pattern elements, contained in a unit region. |
