发明名称 METHOD OF FABRICATING ELECTROMAGNETIC WAVE SHIELDING MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a method of fabricating an electromagnetic wave shielding material which can form a fine metal pattern with high accuracy without carrying out an etching process, and which can achieve good adhesion between the metal pattern and a substrate. SOLUTION: The method of fabricating the electromagnetic wave shielding material comprises the following processes which are carried out in this order: a process (a) of forming a polymerization initiating layer containing a polymer having a polymerization initiating group on the substrate transparent to visible lights; a process (b) of forming, on the polymerization initiating layer, a region wherein polymers having a functional group interacting with an electroless plating catalyst or its precursor are directly chemical-bonded into a pattern; a process (c) of applying the electroless plating catalyst or its precursor to the region; and a process (d) of carrying out electroless plating to form the metal pattern. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005228879(A) 申请公布日期 2005.08.25
申请号 JP20040035247 申请日期 2004.02.12
申请人 FUJI PHOTO FILM CO LTD 发明人 KANO TAKEYOSHI
分类号 H05K9/00;G09F9/00;(IPC1-7):H05K9/00 主分类号 H05K9/00
代理机构 代理人
主权项
地址