发明名称 HEAT PORDUCING MATERIAL IN THIN FILM FORM AND METHOD FOR MANUFACTURE THEREOF
摘要 <p>A heat producing material in a thin film form, which comprises a thin film comprising MoSi2 as a main component formed on a substrate; a thin film heating element comprising a substrate and, formed thereon, a thin MoSi2 film; and a method for manufacturing the thin film heating element, which comprises depositing MoSi2 directly on a crucible or the like as a thin film by means of a RF magnetron sputtering system or the like. The thin film heating element has allowed the solution of the problems associated with a conventional heating element using silicon carbide, molybdenum, tantalum or tungsten, that a thin film element and a small size element are difficult to manufacture, the form of the element is frequently limited to a plate and a wire, and heat efficiency is poor. The above method has improved defects of conventional MoSi2 materials and has allowed the manufacture of the above heating element capable of heating with high efficiency.</p>
申请公布号 WO2005076666(A1) 申请公布日期 2005.08.18
申请号 WO2004JP03989 申请日期 2004.03.23
申请人 THE DOSHISHA;NARUO, NOBORU;YOSHIKADO, SHINZO;WAKISAKA, KENICHI 发明人 NARUO, NOBORU;YOSHIKADO, SHINZO;WAKISAKA, KENICHI
分类号 H05B3/20;H05B3/10;H05B3/12;H05B3/14;H05B3/26;(IPC1-7):H05B3/14 主分类号 H05B3/20
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