| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition used in a step of producing a semiconductor such as IC, in production of a liquid crystal or a circuit board of a thermal head or the like, and in another photofabrication process, and giving a pattern difficult to fall; a compound used in the photosensitive composition; and a pattern forming method using the photosensitive composition. <P>SOLUTION: The photosensitive composition contains an iodonium salt or a sulfonium salt having an anion having a ring structure containing -SO<SB>2</SB>- as a compound which generates an acid upon irradiation with an actinic ray or a radiation. The pattern forming method uses the photosensitive composition. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
