发明名称 CLEANER AND CLEANING METHOD FOR SEMICONDUCTOR BASE SUBSTANCE
摘要 PROBLEM TO BE SOLVED: To provide a cleaner and a cleaning method, which eliminate a resist and the scum of the resist without corroding a semiconductor base material. SOLUTION: The semiconductor base substance, such as a copper wiring board, is treated using a cleaner consisting of a aqueous solution, which contains at least (1) any one of 1,8-diazabicyclo[5.4.0]-7-undecene, 1,4-diazabicyclo[2.2.2]octan, and 1,5-diazabicyclo[4.3.0]-5-nonen of 0.01 to 5 wt%, and (2) a water soluble organic solvent of 10 to 80 wt%. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005223030(A) 申请公布日期 2005.08.18
申请号 JP20040027526 申请日期 2004.02.04
申请人 MITSUBISHI GAS CHEM CO INC 发明人 MATSUNAGA HIROTSUGU;YOSHIDA HIROSHI;OTO HIDE
分类号 C11D1/34;C11D1/90;C11D7/18;C11D7/32;C11D7/50;H01L21/304;H01L21/3213;H01L21/768;(IPC1-7):H01L21/304;H01L21/321 主分类号 C11D1/34
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