发明名称 PROCESS FOR PRODUCING WIRING BOARD AND PROCESS FOR FABRICATING ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To deposit a metal layer only at a required part and to form wiring by a simple production process. SOLUTION: The process for producing a wiring board comprises steps for (a) providing a catalyst 22 in the first and second regions 12 and 14 of a substrate 10, (b) decomposing inter-atomic bonding in the second region 14 of the substrate 10 by irradiating that region through vacuum UV radiation 26, (c) removing the part of the catalyst 22 provided in the second region 14 by cleaning the substrate 10, and (d) depositing a metal layer 36 on the part of the catalyst 22 left in the first region 12 to form wiring of the metal layer 36 along the first region 12. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005223065(A) 申请公布日期 2005.08.18
申请号 JP20040028119 申请日期 2004.02.04
申请人 SEIKO EPSON CORP 发明人 FURUHATA HIDEMICHI;KIMURA SATOSHI;MARUMO MINORU
分类号 C23C2/02;C23C26/00;C23C28/02;G03F7/004;G03F7/40;H01L23/12;H05K3/18;(IPC1-7):H05K3/18 主分类号 C23C2/02
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