| 发明名称 |
Fluorinated surfactants for aqueous acid etch solutions |
| 摘要 |
Novel aqueous, acid etch solutions comprising a fluorinated surfactant are provided. The etch solutions are used with a wide variety of substrates, for example, in the etching of silicon oxide-containing substrates.
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| 申请公布号 |
US2005181620(A1) |
申请公布日期 |
2005.08.18 |
| 申请号 |
US20050081196 |
申请日期 |
2005.03.16 |
| 申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
PARENT MICHAEL J.;SAVU PATRICIA M.;FLYNN RICHARD M.;ZHANG ZHONGXING;LAMANNA WILLIAM M.;QIU ZAI-MING;I. MOORE GEORGE G. |
| 分类号 |
C09K13/08;H01L21/311;(IPC1-7):H01L21/302;H01L21/461 |
主分类号 |
C09K13/08 |
| 代理机构 |
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