CAPACITOR HAVING ENHANCED STRUCTURAL STABILITY, METHOD OF MANUFACTURING THE CAPACITOR, SEMICONDUCTOR DEVICE HAVING THE CAPACITOR, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE,申请号KR20040008770-传众专利搜索

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发明名称	CAPACITOR HAVING ENHANCED STRUCTURAL STABILITY, METHOD OF MANUFACTURING THE CAPACITOR, SEMICONDUCTOR DEVICE HAVING THE CAPACITOR, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20050080670(A)	申请公布日期	2005.08.17
申请号	KR20040008770	申请日期	2004.02.10
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	KIM, DAE HWAN;HUH, MIN;SHIN, DONG WON;LEE, BYUNG HYUN
分类号	H01L21/02;H01L21/8242;H01L27/02;H01L27/108;H01L29/92;(IPC1-7):H01L21/824	主分类号	H01L21/02
代理机构		代理人
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