发明名称 ANNEALING WAFER MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent a wafer from being smeared without reducing a wafer production efficiency in an annealing treatment. SOLUTION: An integrated vertical type boat 3, a stage 4 and a table 5 are freely protrudably and retractably in a process tube 10. The table 5 is mounted in a table mounting part 6. Further, a short tube 15 of smaller diameter tube type than the process tube 10 is disposed to surround the table 5 and detachably provided in the table mounting part 6. That is, the vertical type boat 3, the stage 4, the table 5, the table mounting part 6 and the short tube 15 are integrated. When this short tube 15 is housed together with the vertical type boat 3, etc. in the process tube 10, the inner wall surface of the process tube 10 is covered with the short tube 15. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005216912(A) 申请公布日期 2005.08.11
申请号 JP20040018312 申请日期 2004.01.27
申请人 KOMATSU ELECTRONIC METALS CO LTD 发明人 MATSUYAMA HIROYUKI
分类号 H01L21/22;H01L21/324;(IPC1-7):H01L21/22 主分类号 H01L21/22
代理机构 代理人
主权项
地址