| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method to easily form a nanostructure on a large-area substrate in a short period of time in a highly efficient process, which can be easily applied to existing processes. <P>SOLUTION: This method to form the nanostructure comprises a stage to form a photoresist layer on a substrate, a stage to form the nanostructure on the photoresist layer, a stage to expose the photoresist layer by irradiating light on the substrate where the nanostructure is formed, a stage to develop the photoresist layer that has been exposed, and a stage to make the substrate have the nanostructure by performing dry etching on the substrate making use of the photoresist layer that has been developed. Using this method, the nanostructure can be easily formed on the large-area substrate in a short period of time in a highly efficient process, which can be easily applicable to existing processes by applying SPR after forming the photoresist layer out of the nanostructure that has been manufactured in advance. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
