发明名称 Inductive element and manufacturing method of the same
摘要 Conductor layers 2 A and insulating layers 4 A are alternately stacked so as to prepare a base material 17 . A plurality of grooves 18 having a predetermined width are formed in a surface of the base material 17 in such a manner that these plural grooves 18 are located parallel to each other along a stacking layer direction in order to form a coil inner peripheral portion. Embedding materials 5 are filled into the grooves 18 . Surfaces 16 of the base material into which the embedding materials 5 have been filled are flattened by polishing. The conductor layers 2 A located adjacent to each other are connected to each other, so that helical coils which constitute inductive elements are constructed. Then, both the front plane and the rear plane of the resultant base material are covered by an insulating layer, which is cut so as to obtain respective chips.
申请公布号 US2005174208(A1) 申请公布日期 2005.08.11
申请号 US20040773318 申请日期 2004.02.09
申请人 TDK CORPORATION 发明人 SATO SHINICHI;OHKUBO HITOSHI;KIKUCHI TOSHIAKI
分类号 H01F41/04;H01F5/00;H01F17/00;H01F17/02;(IPC1-7):H01F5/00 主分类号 H01F41/04
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