| 摘要 |
PROBLEM TO BE SOLVED: To provide an organic material applying apparatus and an organic material applying method in which material utilization efficiency is good, a homogeneous organic material film can be applied onto a substrate surface and further a chemical amplification resist can be applied without lowering resist characteristics. SOLUTION: A substrate 2 is mounted on a stage 1 equipped with a baking treating mechanism. After decompressing the inside of a chamber 3, first baking treatment is performed to the substrate 2 by the stage 1. After the inside of the chamber 3 is replaced with an inert gas atmosphere, while holding the substrate 2 at a prebaking temperature of an organic material 7 by second baking treatment, a nozzle 6 provided freely movably above the stage 1 is moved above the substrates 2 and ejects the organic material 7 while moving so as to scan in a direction of an arrow 8. By this process, the organic material 7 is applied on a surface of the substrate 2. COPYRIGHT: (C)2005,JPO&NCIPI
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