POLISHING CLOTH FOR NONWOVEN FABRIC BASE, AND ITS FABLICATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polishing pad capable of obtaining satisfactory flatness and polishing performance by preventing the surface sag and edge sag of a polishing object or subtle unevenness caused by to hard resin in polishing.

SOLUTION: One kind of thermoplastic polyurethane is wet-impregnated and solidified in a nonwoven fabric. The foaming of polyurethane is treated with a solvent, and hardened with a hardening agent.

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