DEVICE AND METHOD FOR DEFECT INSPECTION

摘要

PROBLEM TO BE SOLVED: To provide a defect inspection device that can efficiently detect an actual defect by removing a false defect due to unevenness caused by the growth of crystal grains or the like generating on the circuit pattern of a semiconductor integerated circuit, and to provide a defect inspection method. SOLUTION: An image Qa photographed by an image detector 101 is stored in a photographing circuit pattern memory 106. A removing circuit pattern memory 105 stores an image Qc showing the circuit pattern of an object to be inspected as an area where a false defect is easy to be generated and the other area. A control computation part 102 generates an image Qb wherein an area corresponding to the area where the false defect of an image Qb is easy to be generated is not indicated in the image Qa from the images Qa and Qc. Defects detected from the image Qb are almost all actual defects. The position of the defects or the number of them or the like is stored as data in a defect memory 103. COPYRIGHT: (C)2005,JPO&NCIPI