发明名称
摘要 <p>Impurities such as O2, CO, CO2 and H2O are eliminated from gaseous mixtures containing them by contacting the gaseous mixtures with at least one alkali metal amide in liquid ammonia at super-atmospheric pressure. Specified alkali metal amides are NaNH2 and KNH2 and they may be used in solution or suspension in NH3. To increase the solubility of NaNH2 in liquid NH3, NaCl may be added. Purification is preferably effected at -70 DEG to + 100 DEG C. and at 50-500 atmospheres. A porous plate of fritted metal may be used to ensure good gas/liquid contact. Examples describe (1) the elimination of O2 and CO from C2H4 intended for polymerization and (2) elimination of O2, CO, CO2 and H2O from a mixture of H2 and N2 intended for NH3 synthesis.ALSO:Impurities such as O2, CO, CO2 and H2O are eliminated from gaseous mixtures containing them by contacting the gaseous mixtures with at least one alkali metal amide in liquid NH3 at super-atmospheric pressure. In an example, O2 and CO are removed from C2H4 intended for polyethylene manufacture. C2H4 from liquefaction of coke-oven gas and containing 18 p.p.m. O2 and 40 p.p.m. CO is compressed to 500 kg./sq. cm. before contact with KNH2 in NH3 at -20 DEG C. After treatment the O2 content was <0.5 p.p.m. and the CO content <1 p.p.m. Entrained NH3 was removed from the C2H4 by passage over molten K at 150 DEG C.</p>
申请公布号 LU38893(A1) 申请公布日期 1960.08.30
申请号 LUD38893 申请日期 1960.06.30
申请人 发明人
分类号 B01D53/34;C01B3/02;C07C7/148;C08F10/00;C10K1/16 主分类号 B01D53/34
代理机构 代理人
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