ATOMIC LAYER DEPOSITION METHODS,申请号EP20030783399-传众专利搜索

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发明名称	ATOMIC LAYER DEPOSITION METHODS
摘要
申请公布号	EP1561239(A2)	申请公布日期	2005.08.10
申请号	EP20030783399	申请日期	2003.11.12
申请人		发明人
分类号	C23C16/38;C23C16/40;C23C16/44;C23C16/455;H01L21/285;H01L21/314;H01L21/316;H01L21/768;(IPC1-7):H01L21/285	主分类号	C23C16/38
代理机构		代理人
主权项
地址

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