发明名称 |
Dual mode hybrid control and method for CMP slurry |
摘要 |
A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.
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申请公布号 |
US6926584(B2) |
申请公布日期 |
2005.08.09 |
申请号 |
US20020267614 |
申请日期 |
2002.10.09 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHANG CHAO-JUNG;CHEN PING-HSU;PENG CHIN-HSIN;LO JUI-CHENG;LU CHIEN-KUO;HUANG CHIEN-LING |
分类号 |
B24B37/04;B24B57/02;(IPC1-7):B24B49/00 |
主分类号 |
B24B37/04 |
代理机构 |
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