发明名称 |
Ion implantation with multiple concentration levels |
摘要 |
A method that includes providing a semiconductor substrate having a mask on a surface thereof. The mask includes a first region having no masking elements and a second region having a plurality of masking elements. Each of the plurality of masking elements has a dimension that is equal to a first length, the first length less than twice a diffusion length of a dopant. The method further includes bombarding the semiconductor substrate and masking element with ions of the dopant. The ions form a first impurity concentration in the first region and a second impurity concentration in the second region.
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申请公布号 |
US6927153(B2) |
申请公布日期 |
2005.08.09 |
申请号 |
US20030374305 |
申请日期 |
2003.02.25 |
申请人 |
XEROX CORPORATION |
发明人 |
RAISANEN ALAN D.;NELSON SHELBY F. |
分类号 |
H01L21/225;H01L21/266;(IPC1-7):H01L21/22 |
主分类号 |
H01L21/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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