发明名称 Verfahren und Vorrichtung für eine verbesserte MOS-Gatestruktur zur Verringerung der Miller'schen Kapazität und der Schaltverluste
摘要 A method for reducing miller capacitance and switching losses in an integrated circuit includes providing a switching gate electrode having respective portions that are coplanar with the source and well regions of the integrated circuit. The switching gate electrode is configured for switching the integrated circuit on and off in response to a relatively small change in applied voltage. A shielding gate electrode is formed with respective portions coplanar with the switching electrode and the well region. The shielding electrode is configured for charging the gate-to-drain overlap region of the integrated circuit.
申请公布号 DE10393138(T5) 申请公布日期 2005.07.28
申请号 DE2003193138T 申请日期 2003.08.20
申请人 FAIRCHILD SEMICONDUCTOR CORP., SOUTH PORTLAND 发明人 KOCON, CHRISTOPHER B.;ELBANHAWY, ALAN
分类号 H01L29/06;H01L29/40;H01L29/78 主分类号 H01L29/06
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