EXPOSURE APPARATUS AND DEVICE PRODUCING METHOD

摘要

An exposure device where a collision between a projection optical system and a substrate or a substrate stage can be easily avoided even if the projection optical system and the substrate are close to each other in distance. An exposure apparatus (EX) has a projection optical system (30) for projecting and transferring a pattern (PA) formed on a mask (R) to a substrate (W) and has a substrate stage (42) placed below the projection optical system (30) and moving, while supporting the substrate (W), in the direction substantially perpendicular to the direction of the optical axis (AX) of the projection optical system (30). The exposure apparatus (EX) further has a detection section (81) provided on the outer periphery of the projection optical system (30) and detecting the position, along the direction of the optical axis (AX), of the substrate stage (42) or the substrate (W) and has a control device (70) for stopping or reversing the movement of the substrate stage (42) based on the result of the detection by the detection section (81).