发明名称 SYNTHETIC SILICA GLASS OPTICAL MATERIAL HAVING HIGH RESISTANCE TO OPTICALLY INDUCED CHANGE IN REFRACTIVE INDEX
摘要 PROBLEM TO BE SOLVED: To provide a synthetic silica glass optical material having high resistance to optical damages by ultraviolet radiation in an ultraviolet wavelength range, particularly in an ultraviolet wavelength region of less than about 250 nm, and particularly exhibiting a low laser-induced density change. SOLUTION: The synthetic silica glass optical material contains aluminum of at least about 0.1 ppm and has H<SB>2</SB>concentration levels greater than about 0.5×10<SP>17</SP>molecules/cm<SP>3</SP>. Additionally, the synthetic silica glass optical material exhibits an H<SB>2</SB>to Al ratio of greater than about 1.2, as measured in 10<SP>17</SP>molecules/cm<SP>3</SP>H<SB>2</SB>per ppm Al. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005200293(A) 申请公布日期 2005.07.28
申请号 JP20040341551 申请日期 2004.11.26
申请人 CORNING INC 发明人 BOEK HEATHER D;HECKLE CHRISTINE E;MOLL JOHANNES;SMITH CHARLENE M
分类号 G02B1/00;B32B9/04;B32B15/00;C03B8/04;C03B20/00;C03C3/06;C03C15/00;C03C17/30;C03C17/32;C03C19/00;(IPC1-7):C03B20/00 主分类号 G02B1/00
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