摘要 |
PROBLEM TO BE SOLVED: To provide a synthetic silica glass optical material having high resistance to optical damages by ultraviolet radiation in an ultraviolet wavelength range, particularly in an ultraviolet wavelength region of less than about 250 nm, and particularly exhibiting a low laser-induced density change. SOLUTION: The synthetic silica glass optical material contains aluminum of at least about 0.1 ppm and has H<SB>2</SB>concentration levels greater than about 0.5×10<SP>17</SP>molecules/cm<SP>3</SP>. Additionally, the synthetic silica glass optical material exhibits an H<SB>2</SB>to Al ratio of greater than about 1.2, as measured in 10<SP>17</SP>molecules/cm<SP>3</SP>H<SB>2</SB>per ppm Al. COPYRIGHT: (C)2005,JPO&NCIPI
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