发明名称 APPARATUS FOR INSPECTING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for inspecting a substrate, capable of accurately observing a defective section and realizing alleviation of observation works. SOLUTION: The apparatus is equipped with a holder 3 which is set at a prescribed angle of gradient; a light source 411 irradiating the substrate to be inspected 4 which is held on the holder 3, with macro illuminating light; a reflective mirror 42 which deflects the macro illuminating light emitted from the light source 411, relative to the surface of the substrate to be inspected 4 so as to obtain a prescribed illumination angle; and a mirror angle adjusting means which rotatably holds the reflective mirror 42 and adjusts the rotational angle of the reflective mirror 42. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005201907(A) 申请公布日期 2005.07.28
申请号 JP20050036343 申请日期 2005.02.14
申请人 OLYMPUS CORP 发明人 YASUDA MAMORU;MATSUMOTO MASARU;SHIMODAIRA AKIHIRO
分类号 G01N21/84;G01M11/00;G02F1/13;G02F1/1333;(IPC1-7):G01N21/84;G02F1/133 主分类号 G01N21/84
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