发明名称 |
Method of protecting semiconductor wafer and adhesive film for protection of semiconductor wafer |
摘要 |
The present invention is to provide a protecting method for a semiconductor wafer and an adhesive film for protection of a semiconductor wafer which makes it possible to straighten or avoid warpage in a semiconductor wafer and to prevent breakage of wafers during conveyance of wafers even if the thickness of a semiconductor wafer is thinned to approximately 150 mum or less. The present invention provides a protecting method for a semiconductor wafer in a step of processing a semiconductor wafer comprising a first step of adhering an adhesive film for protection of a semiconductor wafer in which an adhesive layer is formed on one surface of a base film to a circuit-formed surface of the semiconductor wafer, a second step of heating the semiconductor wafer to which the adhesive film for protection of the semiconductor wafer is adhered, a third step of processing a non-circuit-formed surface of the semiconductor wafer by fixing the semiconductor wafer to which the adhesive film for protection of the semiconductor wafer is adhered on a grinding machine or an abrasive machine, and a fourth step of peeling the adhesive film for protection of the semiconductor wafer from the semiconductor wafer.
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申请公布号 |
US2005164509(A1) |
申请公布日期 |
2005.07.28 |
申请号 |
US20050051625 |
申请日期 |
2005.01.27 |
申请人 |
MITSUI CHEMICALS, INC. |
发明人 |
KOSHIMIZU TAKANOBU;KATAOKA MAKOTO;MIYAKAWA MASAFUMI;FUKUMOTO HIDEKI;SAIMOTO YOSHIHISA |
分类号 |
H01L21/304;C09J7/02;G06K19/077;H01L21/00;H01L21/30;H01L21/302;H01L21/44;H01L21/50;H01L21/68;(IPC1-7):H01L21/44 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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