PHOTOMASK STRUCTURE FOR PREVENTING STATIC ELECTRICITY,申请号SG20030001645-传众专利搜索

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发明名称	PHOTOMASK STRUCTURE FOR PREVENTING STATIC ELECTRICITY
摘要
申请公布号	SG112876(A1)	申请公布日期	2005.07.28
申请号	SG20030001645	申请日期	2003.03.13
申请人	TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.	发明人	TIEN CHI, WU;KOU-CHOU CHEN;HUAI-JEN, HSU;GEORGE HUANG
分类号	G03F1/14;H01L23/60;(IPC1-7):G03F1/14	主分类号	G03F1/14
代理机构		代理人
主权项
地址

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