发明名称 PRODUCTION METHOD FOR GROUP III NITRIDE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a group III nitride crystal at an increased growth rate. SOLUTION: The production method for a group III nitride crystal causes the crystal to grow by bringing a melt 7 containing a group III element and an alkali metal into contact with nitrogen plasma 8a. In the method, the minimum distance X between the surface of the melt 7 and the surface of a substrate 10 is preferably 50 mm or less. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005194146(A) 申请公布日期 2005.07.21
申请号 JP20040003260 申请日期 2004.01.08
申请人 SUMITOMO ELECTRIC IND LTD;MORI YUSUKE 发明人 SASAKI TAKATOMO;MORI YUSUKE;YOSHIMURA MASASHI;KAWAMURA SHIRO;HIROTA TATSU
分类号 C30B29/38;C30B11/00;C30B11/12;C30B19/02;C30B29/40;H01L21/208;(IPC1-7):C30B29/38 主分类号 C30B29/38
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