发明名称 |
PRODUCTION METHOD FOR GROUP III NITRIDE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a group III nitride crystal at an increased growth rate. SOLUTION: The production method for a group III nitride crystal causes the crystal to grow by bringing a melt 7 containing a group III element and an alkali metal into contact with nitrogen plasma 8a. In the method, the minimum distance X between the surface of the melt 7 and the surface of a substrate 10 is preferably 50 mm or less. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005194146(A) |
申请公布日期 |
2005.07.21 |
申请号 |
JP20040003260 |
申请日期 |
2004.01.08 |
申请人 |
SUMITOMO ELECTRIC IND LTD;MORI YUSUKE |
发明人 |
SASAKI TAKATOMO;MORI YUSUKE;YOSHIMURA MASASHI;KAWAMURA SHIRO;HIROTA TATSU |
分类号 |
C30B29/38;C30B11/00;C30B11/12;C30B19/02;C30B29/40;H01L21/208;(IPC1-7):C30B29/38 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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地址 |
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