发明名称 Method for forming thin film on synthetic resin and multilayer film
摘要 An object of the invention, in the formation of a thin film on a synthetic resin, is to improve adhesiveness between the synthetic resin and the thin film by a relatively simple method. In the invention, a protective metallic layer is formed on a synthetic resin, and one thin film of (1) a semi-transmitting metallic mirror, (2) a total reflection metallic mirror, or (3) a transparent conductive film is formed. The material of the protective metallic layer is preferably selected from the group of Ti, Zr, Nb, Si, In, and Sn, and for sake of ensuring adhesiveness between the synthetic resin and the thin film, the film thickness of the protective metal layer is preferably 1 nm or more. Also, when the film thickness of the protective metallic layer is large, transmittance of the whole of the laminated film is lowered due to light absorption by the protective metallic layer, and hence, the film thickness of the protective metallic layer is preferably not more than 5 nm.
申请公布号 US2005158575(A1) 申请公布日期 2005.07.21
申请号 US20040495077 申请日期 2004.05.07
申请人 HATTORI KENJI;OGINO ETSUO 发明人 HATTORI KENJI;OGINO ETSUO
分类号 G02B5/02;B32B15/08;C23C14/06;C23C14/20;G02B1/10;G02B5/08;G02B5/20;G02F1/1333;G02F1/1335;G02F1/13357;(IPC1-7):B32B15/08;C23C14/32 主分类号 G02B5/02
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