| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To utilize a stage for a general exposure device, as it is, as a stage for pattern drawing of a mask-drawing device. <P>SOLUTION: A mask formed by drawing a pattern for a mask on a circular quartz plate 103, which is a first quartz plate having a circular shape of a diameter of about 300 mm or about 200 mm and a thickness of≤0.8 mm, segmenting a portion, including the drawn pattern 106 drawn with the pattern of the circular quartz plate 103 and sticking the same to a rectangular quartz plate 109 which is a second quartz plate having a rectangular shape, and a thickness of≥5 mm is used as a mask 110. According to such a configuration, the wafer stage for the general exposure devices already popular as commercial items can be utilized as it is as a stage for a device of drawing a mask and since the items to be newly manufactured at developing of the mask drawing device are decreased, the product costs taking the cost for development of designs, etc., into consideration can be reduced drastically. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
