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经营范围
发明名称
Polymer, Resist Composition and Patterning Process
摘要
申请公布号
KR100501600(B1)
申请公布日期
2005.07.18
申请号
KR20000067373
申请日期
2000.11.14
申请人
发明人
分类号
G03F7/027;G03F7/004;G03F7/039;(IPC1-7):G03F7/027
主分类号
G03F7/027
代理机构
代理人
主权项
地址
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