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发明名称
Low-k膜用之蚀刻液及蚀刻方法
摘要
本发明系有关,含有(1)HF及/或其盐、(2)H2SO4及因应需要进而含有(3)水之low–k膜用之蚀刻液。
申请公布号
TW200524040
申请公布日期
2005.07.16
申请号
TW093134135
申请日期
2004.11.09
申请人
大金工业股份有限公司
发明人
毛塚健彦
分类号
H01L21/308
主分类号
H01L21/308
代理机构
代理人
林志刚
主权项
地址
日本
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