MASK, MASK CONTAMINATION MONITOR METHOD, PROGRAM AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a mask where collected mask contamination can be easily monitored, and to provide a mask contamination monitor method, an exposure method, and an associated program.

SOLUTION: A mask is provided with a copy pattern formation region to be duplicated to a film for exposure and is available to monitor the amount of contamination collected when the copy pattern formation region is duplicated to the film for exposure. It is also provided with a monitor pattern formation area formed by placing multiple openings in the surrounding of the copy pattern formation region. A monitor pattern is formed in such a way that multiple openings are placed in a region whose diameter is greater than a beam diameter in each exposure beam.

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