发明名称 |
MASKLESS FABRICATION OF WAVEGUIDE MIRRORS |
摘要 |
A method of fabricating a waveguide mirror that involves etching a trench in a silicon substrate; depositing a film (e.g. silicon dioxide) over the surface of the silicon substrate and into the trench; ion etching the film to remove at least some of the deposited silicon dioxide and to leave a facet of film in inside corners of the trench; depositing a layer of SiGe over the substrate to fill up the trench; and planarizing the deposited SiGe to remove the SiGe from above the level of the trench. |
申请公布号 |
WO2004106986(A3) |
申请公布日期 |
2005.07.14 |
申请号 |
WO2004US17071 |
申请日期 |
2004.05.28 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
LEON, FRANCISCO, A.;WEST, LAWRENCE, C.;WOJCIK, GREGORY, L.;WADA, YUICHI |
分类号 |
G02B6/12;G02B6/122;G02B6/132;G02B6/136;H01L21/00;H01L21/76 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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