| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve the problem that, regarding a method and apparatus for performing partial etching and pattern etching using electrolytic reaction, heretofore, an etching line can not be finely formed at the end part of a cell due to the problem of alignment precision in the apparatus, and to provide a method and apparatus where fine wire etching is possible, and the line can be formed at the end part of the cell. <P>SOLUTION: The electrolytic etching method for a substrate 105 in which the layer to be etched is formed on the surface comprises: a stage wherein the working part 111 of a working electrode 101 is arranged at the side more outwardly than the end face of the substrate 105 with a fixed gap provided from the end face of the substrate; and a stage wherein electric current is passed between the substrate 105 and the working electrode 101. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
